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Challenges and Opportunities in High-K Gate Dielectric Technology

著者名:
Niwa, M.
Harada, Y.
Yamamoto, K.
Hayashi, S.
Mitsuhashi, R.
Eriguchi, K.
Kubota, M.
Hoshino, Y.
Kido, Y
Kwong, D.L.
さらに 5 件
掲載資料名:
Rapid thermal and other short-time processing technologies III : proceedings of the international symposium
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
2002-11
発行年:
2002
開始ページ:
99
終了ページ:
116
総ページ数:
18
出版情報:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773348 [1566773342]
言語:
英語
請求記号:
E23400/200211
資料種別:
国際会議録

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