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GROWTH TECHNOLOGY FOR 200mm ANTIMONY HEAVILY DOPED SILICON SINGLE CRYSTALS

著者名:
Zhou, Q.
Qin, F.
Zhou, J.
Fang, F.
Wang, J.
Tu, H.
さらに 1 件
掲載資料名:
Semiconductor silicon 2002 : proceedings of the ninth International Symposium on Silicon Materials Science and Technology
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
2002-2
発行年:
2002
開始ページ:
307
終了ページ:
310
総ページ数:
4
出版情報:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773744 [1566773741]
言語:
英語
請求記号:
E23400/2002-2
資料種別:
国際会議録

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