ETCHING OF SILICON NATIVE OXIDE USING ULTR-SLOW MULTICHARGED Arq+ IONS
- 著者名:
Le Roux, V. Machicoane, G. Borsoni, G. Korwin-Pawlowski, M. Bechu, N. Kerdiles, S. Laffitte, R. Valuer, L. Roman, P. Wu, C.-T. Ruzyllo, J. - 掲載資料名:
- Cleaning technology semiconductor device manufacturing : proceedings of the seventh international symposium
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 2001-26
- 発行年:
- 2001
- 開始ページ:
- 249
- 終了ページ:
- 257
- 総ページ数:
- 9
- 出版情報:
- Pennington, N.J.: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566773591 [1566773598]
- 言語:
- 英語
- 請求記号:
- E23400/200126
- 資料種別:
- 国際会議録
類似資料:
SPIE-The International Society for Optical Engineering |
Electrochemical Society |
Electrochemical Society |
Electrochemical Society |
Electrochemical Society |
Materials Research Society |
Electrochemical Society |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society for Optical Engineering |
Electrochemical Society |
Electrochemical Society |
Electrochemical Society |