EFFECT OF WAFER BACKSIDE ON PARTICLE ADDITION BEHAVIOUR OF HF-RCA SEQUENCE

EFFECT OF WAFER BACKSIDE ON PARTICLE ADDITION BEHAVIOUR OF HF-RCA SEQUENCE

著者名:

掲載資料名:

Cleaning technology semiconductor device manufacturing : proceedings of the seventh international symposium

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

2001-26

発行年:

2001

開始ページ:

172

終了ページ:

179

総ページ数:

8

出版情報:

Pennington, N.J.: Electrochemical Society

ISSN:

01616374

ISBN:

9781566773591 [1566773598]

言語:

英語

請求記号:

E23400/200126

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014030
シリーズID:	PA00000028
会議名:	International Symposium on Cleaning Technology in Semiconductor Device Manufacturing ; Fall Meeting of the Electrochemical Society
回次:	7th ; 2001
会議開催地:	San Francisco, CA, USA
会議開催年:	2001.09.00

類似資料:

1 国際会議録 CARRIER INDUCED SILICON PITTING IN THE HF-RCA CLEANING SEQUENCES Lodi, D., Bellandi, E., Ninni, R. Electrochemical Society	7 国際会議録 EFFICIENCY OF OZONE DISSOLUTION INTO AMBIENT TEMPERATURE RINSE BATHS Wolke, K., Schenkl, M., Alessandri, M., Bellandi, E. Electrochemical Society
2 国際会議録 PREVENTION OF Si ETCHING IN DILUTED SC1 SOLUTIONS Bellandi, E., Alessandri, M., Lodi, D., Strada, M., Pipia, S., Petitdidier, S., Levy, D. Electrochemical Society	8 国際会議録 Optical Characterisation of High-? Materials Deposited by ALCVD Bellandi, E., Crivelli, B., Elbaz, A., Alessandri, M., Boher, P., Defranoux, C. SPIE-The International Society for Optical Engineering
3 国際会議録 THE ST CLEAN DUAL STEP CLEANING CONCEPT Bellandi, R., Alessandri, M., Lodi, D., Pipia, F. Electrochemical Society	9 国際会議録 Optical Characterisation of High-? Materials Deposited by ALCVD Bellandi, E., Crivelli, B., Elbaz, A., Alessandri, M., Boher, P., Defranoux, C. Electrochemical Society
4 国際会議録 PARTICLE REMOVAL EFFICIENCY OF DILUTED HF SOLUTIONS Alessandri, M., Bellandi, E., Pipia, F., Crivelli, B., Wolke, K., Schenkl, M. Electrochemical Society	10 国際会議録 EFFECT OF WAFER BACKSIDE CLEAN PROCESS ON THE ULSI LITHOGRAPHY Balasubramanian, N., Roy, M-M., Pauline, H.G., Dow, F. P. Electrochemical Society
5 国際会議録 Study of SiO2 Modifications Induced by Oxygen Plasmas and Their Effect on Wet Processes A. Votta, E. Bellandi, M. Alessandri, A. Vedda, A. Ferretti Electrochemical Society	11 国際会議録 EFFECT OF WAFER BACKSIDE CLEAN PROCESS ON THE ULSI LITHOGRAPHY Balasubramanian, N., Roy, M-M., Dow, F.P., Pauline, H.G. Electrochemical Society
6 国際会議録 OPTIMIZATION OF ETCHING UNIFORMITY AND REPEATABILITY IN DILUTED HF Bellandi, E., Alessandri, M., Tonti, A., Pipia, F., Wolke, K., Schenkl, M., Geomini, M., Kwakman, L.F.T. Electrochemical Society	12 国際会議録 Electronic Structure Analysis for the Effect of Hf, Zr Addition on the Ms of TiNi Alloys Cui, L., Wang, X., Qi, M., Yang, D. Trans Tech Publications

1

2

3

4

5

6

7

8

9

10

11

12