REDUCTION OF SURFACE METALLIC CONTAMINATION THROUGH OPTIMIZED RINSING AND SINGLE-WAFER DRYING

REDUCTION OF SURFACE METALLIC CONTAMINATION THROUGH OPTIMIZED RINSING AND SINGLE-WAFER DRYING

著者名:

Fyen, W.

掲載資料名:

Cleaning technology semiconductor device manufacturing : proceedings of the seventh international symposium

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

2001-26

発行年:

2001

開始ページ:

91

終了ページ:

101

総ページ数:

11

出版情報:

Pennington, N.J.: Electrochemical Society

ISSN:

01616374

ISBN:

9781566773591 [1566773598]

言語:

英語

請求記号:

E23400/200126

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014030
シリーズID:	PA00000028
会議名:	International Symposium on Cleaning Technology in Semiconductor Device Manufacturing ; Fall Meeting of the Electrochemical Society
回次:	7th ; 2001
会議開催地:	San Francisco, CA, USA
会議開催年:	2001.09.00

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2 国際会議録 The use of unpatterned wafer inspection for immersion lithography defectivity studies [6152-68] Holsteyns, F., Cheung, L., Van Den Heuvel, D., Marcuccilli, G, Simposon, G., Brun, R., Steinbach, A.., Fyen, W., … SPIE - The International Society of Optical Engineering	8 国際会議録 EFFECTIVE POST-ETCH RESIDUE REMOVAL ON LOW-K FILMS USING SINGLE WAFER PROCESSING Kesters, E., Ghekiere, J., Van Doorne, P., Vereecke, G., Mertens, P.W., Heyns, M.M. Electrochemical Society
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4 国際会議録 *CLEANING OF METAL CONTAMINATION Mertens, P.W., Hurd, T.Q., Graf, D., Meuris, M., Schmidt, H.F., Heyns, M.M. Electrochemical Society	10 国際会議録 CORROSION OF ALUMINUM ALLOYS DURING DRYING OF METALLIZED WAFERS Vos, R., Meuris, M., Mertens, P., Heyns, M., Hatcher, Z. Electrochemical Society
5 国際会議録 Effect of Metal Contamination and Improved Cleaning Strategies Mertens, P.W., Bearda, T., Lowewenstein, L.M., Martin, A.R., Hub, W., Kolbesen, B.O., Teerlink, I., Vos, R., Baeyens, … Electrochemical Society	11 国際会議録 INVITED: WAFER CLEANING: A QUANTIFIABLE PROCESS STEP Mertens, P.W., Loewenstein, L., Vos, R., De Gendt, S., Bearda, T., Heynes, M.M. Electrochemical Society
6 国際会議録 MODELLING OF CRYSTAL ORIGINATED PARTICLES AND THEIR IMPACT ON GATE OXIDE INTEGRITY Bearda, T., Mertens, P.W., Woerlee, P.H., Wallinga, H., Sebmolke, R., Heyns, M. Electrochemical Society	12 国際会議録 SUB 1OOnm PARTICLE REMOVAL WITH DEIONIZED WATER AND A MEGASONIC FREQUENCY OF 835kHz Lauerhaas, J., Wu, Y., Xu, K., Vereecke, G., Vos, R., Kenis, K., Mertens, P., Nicolosi, T., Heyns, M. Electrochemical Society

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