Suppression of Plasma Charging Damage in Sub Micron Metal-Oxide-Scmiconductor Field-Effect Transistors (MOSFETS) with Gate Oxynitride by Two-Step Nitridation
- 著者名:
- 掲載資料名:
- Thin film materials, processes, and reliability : proceedings of the international symposium
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 2001-24
- 発行年:
- 2001
- 開始ページ:
- 8
- 終了ページ:
- 13
- 総ページ数:
- 6
- 出版情報:
- Pennington, N.J.: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566773577 [1566773571]
- 言語:
- 英語
- 請求記号:
- E23400/200124
- 資料種別:
- 国際会議録
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