TCAD And Its Application In 0.25um CMOS Process And Integration
- 著者名:
- 掲載資料名:
- Semiconductor technology (ISTC 2001) : proceedings of the 1st International Conference on Semiconductor Technology
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 2001-17
- 発行年:
- 2001
- 開始ページ:
- 498
- 終了ページ:
- 506
- 総ページ数:
- 9
- 出版情報:
- Pennington, N.J.: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566773508 [1566773504]
- 言語:
- 英語
- 請求記号:
- E23400/200117
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
7
国際会議録
Appication of an Electrochemical Copper Metallization-Planarization Process to sub-0.25 um Features
Electrochemical Society |
Electrochemical Society |
Electrochemical Society |
3
国際会議録
Performance of immersion lithography for 45-nm-node CMOS and ultra-high density SRAM with 0.25um2
SPIE - The International Society of Optical Engineering |
Electrochemical Society |
SPIE-The International Society for Optical Engineering |
Electrochemical Society |
MRS - Materials Research Society |
Electrochemical Society |
Electrochemical Society |
SPIE-The International Society for Optical Engineering |