Contact Processes For Advanced DRAM And CMOS Logic Devices*
- 著者名:
Gambino, J. Bandy, K. Chapple-Sokol, J. Conti, R. Dobuzinsky, D. Iggulden, R. Maldei, M. Peterson, K. Rupp, T. Stamper, T. Stephens, J. Sardesai, V. Wise, M. Wagner, T. Weber, S. Wistrom, R. - 掲載資料名:
- Semiconductor technology (ISTC 2001) : proceedings of the 1st International Conference on Semiconductor Technology
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 2001-17
- 発行年:
- 2001
- 開始ページ:
- 473
- 終了ページ:
- 484
- 総ページ数:
- 12
- 出版情報:
- Pennington, N.J.: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566773508 [1566773504]
- 言語:
- 英語
- 請求記号:
- E23400/200117
- 資料種別:
- 国際会議録
類似資料:
Electrochemical Society |
MRS - Materials Research Society |
SPIE-The International Society for Optical Engineering |
Electrochemical Society |
Electrochemical Society |
9
国際会議録
Selection of attenuated phase shift mask compatible contact hole resists for KrF optical lithography
SPIE - The International Society of Optical Engineering |
Electrochemical Society |
Materials Research Society |
Electrochemical Society |
Materials Research Society |
Materials Research Society |
Materials Research Society |