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High Thermal Stability Ni/Co Silicide on SiGe for Raised Source/Drain Structures

著者名:
掲載資料名:
Rapid thermal and other short-time processing technologies II : proceedings of the international symposium
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
2001-9
発行年:
2001
開始ページ:
363
終了ページ:
370
総ページ数:
8
出版情報:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773157 [1566773156]
言語:
英語
請求記号:
E23400/2001-9
資料種別:
国際会議録

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