Shallow Junction Formation by Small Cluster Implantation
- 著者名:
Lu, X. Shao, L. Wang, X. Chen, Q. Liu, J. Chu, W.K. Bennett, J. Larson, L. - 掲載資料名:
- Rapid thermal and other short-time processing technologies II : proceedings of the international symposium
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 2001-9
- 発行年:
- 2001
- 開始ページ:
- 337
- 終了ページ:
- 344
- 総ページ数:
- 8
- 出版情報:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566773157 [1566773156]
- 言語:
- 英語
- 請求記号:
- E23400/2001-9
- 資料種別:
- 国際会議録
類似資料:
Electrochemical Society |
Electrochemical Society |
Electrochemical Society |
MRS - Materials Research Society |
3
国際会議録
Stability of Ultra-Shallow Junctions Formed by 0.2 keV Boron Implantation and Spike Annealing
Electrochemical Society |
Materials Research Society |
Electrochemical Society |
Materials Research Society |
Materials Research Society |
MRS - Materials Research Society |
Electrochemical Society |
Materials Research Society |