Material and Process Considerations of Ultra thin Silicon (Oxy) Nitride Films Grown on Silicon and SiO2 Surfaces

Material and Process Considerations of Ultra thin Silicon (Oxy) Nitride Films Grown on Silicon and SiO2 Surfaces

著者名:

D'Emic, C.P.

掲載資料名:

Silicon Nitride and Silicon Dioxide Thin Insulating Films : proceedings of the sixth International Symposium

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

2001-7

発行年:

2001

開始ページ:

174

終了ページ:

190

出版情報:

Pennington, N.J.: Electrochemical Society

ISSN:

01616374

ISBN:

9781566773133 [156677313X]

言語:

英語

請求記号:

E23400/2001-7

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014011
シリーズID:	PA00000028
会議名:	Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films
回次:	6th
会議開催地:	Washington, D.C., USA
会議開催年:	2001.03.25-2001.03.30

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