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Processing of Thick Thermal Gate Oxides in Trenchs

著者名:
Wu, C.T.
Ridley, R.
Dolny, G.
Grebs, T.
Hao, J.
Suliman, S.
Venkataraman, B.
Awadelkarim, O.
Williams, R.
Roman, P.
Ruzyllo, J.
さらに 6 件
掲載資料名:
Silicon Nitride and Silicon Dioxide Thin Insulating Films : proceedings of the sixth International Symposium
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
2001-7
発行年:
2001
開始ページ:
127
終了ページ:
133
出版情報:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773133 [156677313X]
言語:
英語
請求記号:
E23400/2001-7
資料種別:
国際会議録

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