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Remote Plasma Deposited Gate Dielectrics on Si and SiGe MOSFETS

著者名:
Ngai, T.
Sharma, R.
Fretwell, J.
Chen, X.
Chen, J.
Brookover, W.
Banerjee, S.
さらに 2 件
掲載資料名:
Silicon Nitride and Silicon Dioxide Thin Insulating Films : proceedings of the sixth International Symposium
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
2001-7
発行年:
2001
開始ページ:
95
終了ページ:
108
出版情報:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773133 [156677313X]
言語:
英語
請求記号:
E23400/2001-7
資料種別:
国際会議録

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