Fully Depleted SIMOX SOI Process Technology for Low Power Digital and RF Device
- 著者名:
Itoh, M. Kawai, Y. Ito, S. Yokomizo, K. Katakura, Y. Fukuda, Y. Ichikawa, F. - 掲載資料名:
- Silicon-on-Insulator Technology and Devices X : proceedings of the tenth International Symposium
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 2001-3
- 発行年:
- 2001
- 開始ページ:
- 331
- 終了ページ:
- 336
- 総ページ数:
- 6
- 出版情報:
- Pennington, N.J.: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566773096 [1566773091]
- 言語:
- 英語
- 請求記号:
- E23400/2001-3
- 資料種別:
- 国際会議録
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8
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Quasi-three-dimensional device simulation of fully depleted MOSFET/SOI focused on surface roughness
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