Enhanced Short-Channel Effects of Sub-50 nm Gate Length MOSFETs with High-k Gate Insulator Films
- 著者名:
Fujimura, R. Takeda, M. Sato, K. Ohmi, S.-I. Ishiwara, H. Iwai, H. - 掲載資料名:
- ULSI Process Integration : proceedings of the International Symposium
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 2001-2
- 発行年:
- 2001
- 開始ページ:
- 313
- 終了ページ:
- 323
- 総ページ数:
- 11
- 出版情報:
- Pennington, N.J.: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566773089 [1566773083]
- 言語:
- 英語
- 請求記号:
- E23400/2001-2
- 資料種別:
- 国際会議録
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