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SiGe HBT/CMOS Technology for RF and High-Speed Digital Applications*

著者名:
Washio, K.  
掲載資料名:
ULSI Process Integration : proceedings of the International Symposium
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
2001-2
発行年:
2001
開始ページ:
155
終了ページ:
164
総ページ数:
10
出版情報:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566773089 [1566773083]
言語:
英語
請求記号:
E23400/2001-2
資料種別:
国際会議録

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