High Quality Silicon Oxide Deposited with A Multipolar Electron Cyclotron Resonance Plasma Source
- 著者名:
- 掲載資料名:
- Thin Film Transistor Technologies V : proceedings of the International Symposium
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 2000-31
- 発行年:
- 2000
- 開始ページ:
- 169
- 終了ページ:
- 175
- 出版情報:
- Pennington, N.J.: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566772983 [1566772982]
- 言語:
- 英語
- 請求記号:
- E23400/200031
- 資料種別:
- 国際会議録
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6
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On Gas-Phase Depletion During LPCVD of GeSi Films using GeH4/SiH4 and GeH4ISi2H6 Gas Sources
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