Electrodeposition of Copper onto Si(111) with Controlled Surface Structure

Electrodeposition of Copper onto Si(111) with Controlled Surface Structure

著者名:

Ji, C. ( Johns Hopkins University )
Oskam, G. ( Johns Hopkins University )
Searson, P. ( Johns Hopkins University )

掲載資料名:

Electrochemical science and technology of copper : proceedings of the international symposium

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

2000-30

発行年:

2000

開始ページ:

64

終了ページ:

70

総ページ数:

7

出版情報:

Pennington, N.J.: Electrochemical Society

ISSN:

01616374

ISBN:

9781566772976 [1566772974]

言語:

英語

請求記号:

E23400/200030

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013999
シリーズID:	PA00000028
会議名:	International symposium on electrochemical science and technology of copper ; Electrochemical Society Meeting
回次:	2000 ; 198th
会議開催地:	Phoenix, AZ, USA
会議開催年:	2000.10.22-2000.10.27

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