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Surface Characterization of Polyurethane Pads Used in Chemical Mechanical Polishing (CMP)

著者名:
Ramsdell, J.
Seal, S.
Li, I.
Richardson, K.A.
Desai, V.
Easter, W.G.
さらに 1 件
掲載資料名:
Chemical Mechanical Planarization : proceedings of the International Symposium
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
2000-26
発行年:
2000
開始ページ:
102
終了ページ:
113
出版情報:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566772938 [1566772931]
言語:
英語
請求記号:
E23400/200026
資料種別:
国際会議録

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