Numerical Simulation of Silicon Carbide Deposition in a Cold Wall CVD Reactor
- 著者名:
Chaix, G. Dallet, A. Matecki, M. de Persis, S. Wang, Y. Teyssandier, F. - 掲載資料名:
- CVD XV, proceedings of the fifteenth International Symposium on Chemical Vapor Deposition
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 2000-13
- 発行年:
- 2000
- 開始ページ:
- 209
- 終了ページ:
- 215
- 総ページ数:
- 7
- 出版情報:
- Pennington, N.J.: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566772785 [1566772788]
- 言語:
- 英語
- 請求記号:
- E23400/200013
- 資料種別:
- 国際会議録
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