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Ultra-Shallow Junction Formation Using Ion Implantation and Rapid Thermal Annealing: Physical and Practical Limits

著者名:
掲載資料名:
Rapid thermal and other short-time processing technologies : proceedings of the international symposium
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
2000-9
発行年:
2000
開始ページ:
49
終了ページ:
60
総ページ数:
12
出版情報:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566772747 [1566772745]
言語:
英語
請求記号:
E23400/2000-9
資料種別:
国際会議録

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