Processing Effects and Electrical Evaluation of ZrO2 Formed by RTP Oxidation of Zr
- 著者名:
Nieh, R. ( (University of Texas at Austin) ) Qi, W-J. ( (University of Texas at Austin) ) Lee, B.H. ( (University of Texas at Austin) ) Kang, L. ( (University of Texas at Austin) ) Jeon, Y. ( (University of Texas at Austin) ) Onishi, K. ( (University of Texas at Austin) ) Gopalan, S. ( (University of Texas at Austin) ) Kang, C.S. ( (University of Texas at Austin) ) Dhrarmarajan, E. ( (University of Texas at Austin) ) Choi, R. ( (University of Texas at Austin) ) Lee, J.C. ( (University of Texas at Austin) ) - 掲載資料名:
- Low and high dielectric constant materials : materials science, processing, and reliability issues : proceedings of the fifth international symposium
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 2000-5
- 発行年:
- 2000
- 開始ページ:
- 214
- 終了ページ:
- 221
- 総ページ数:
- 8
- 出版情報:
- Pennington, N.J.: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566772709 [1566772702]
- 言語:
- 英語
- 請求記号:
- E23400/2000-5
- 資料種別:
- 国際会議録
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10
国際会議録
Multiple Spike RTP Process for Forming Ultra Thin Oxides for MOS Gate Dielectric Application
Electrochemical Society |
MRS - Materials Research Society |
Trans Tech Publications |
Materials Research Society |
Electrochemical Society |