Blank Cover Image

Characterization of High-K Dielectrics Using the Non-Contact Surface Charge Profiler (SCP) Method

著者名:
Roman, P. ( (Penn State University) )
Lee, D. ( (Penn State University) )
Mumbauer, P. ( (PRIMAXX, Inc.) )
Grant, R. ( (PRIMAXX, Inc.) )
Kamieniecki, E. ( (QC Solutions, Inc.) )
Ruzyllo, J. ( (Penn State University) )
さらに 1 件
掲載資料名:
Low and high dielectric constant materials : materials science, processing, and reliability issues : proceedings of the fifth international symposium
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
2000-5
発行年:
2000
開始ページ:
187
終了ページ:
192
総ページ数:
6
出版情報:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566772709 [1566772702]
言語:
英語
請求記号:
E23400/2000-5
資料種別:
国際会議録

類似資料:

1 国際会議録 Characterization of Thin Dielectric Layers using the Non-Contact Surface Charge Profiler (SCP) Method

Roman, P., Lee, D.D., Wang, J., Mumbauer, P., Grant, R., Tower, J., Kamieniecki, E., Lukasiak, L., Ruzyllo, aud J.

Electrochemical Society
7 国際会議録 STUDY OF THE EFFECT OF SILICON SURFCE TREATMENT ON EOT IN HIGH-k DIELECTRIC MOS GATE STACK

Chang, K., Shanmugasundaram, K., Lee, D.-O., Roman, P., Shallenberger, J., Chang, F.-M., Wang, J., Beck, R., Mumbauer, …

Electrochemical Society
2 国際会議録 Process monitoring using surface charge profiling(SCP)method

Ruzyllo,J., Roman,P., Staffa,J., Kashkoush,I., Kamieniecki,E.

SPIE-The International Society for Optical Engineering
8 国際会議録 GAS-PHASE SURFACE CONDITIONING IN A HIGH-k GATE CLUSTER

Roman, P., Lee, D.-O., Wang, J., Wu, C.-T., Subramanian, V., Brubaker, M., Mumbauer, P., Grant, R., Ruzyllo, J.

Electrochemical Society
3 国際会議録 MONITORING OF Fe CONTAMINATION ON Si SURFACES USING NON-CONTACT SURFACE CHARGE PROFILER

Roman, P., Kashkoush, I., Novak, R.E., Kamieniecki, E., Ruzyllo, J.

Electrochemical Society
9 国際会議録 CLEANING OF SILICON SURFACE AFTER RIE USING UV/OZONE AND HF/CH3OH

Hwang, D.K., Ruzyllo, J., Kamieniecki, E.

Electrochemical Society
4 国際会議録 Monitoring of HF/H2O Treated Silicon Surfaces Using Non-Contact Surface Charge Measurements

Roman, P., Hwang, D., Torek, K., Ruzyllo, J., Kamieniecki, E.

MRS - Materials Research Society
10 国際会議録 49 Characteristics of Hf(Si,O) Gate Dielectrics as a Function of Hf Content

Chang, K., Shallenberger, J., Chang, F.-M., Shanmugasundaram, K., Roman, P., Mumbauer, P., Ruzyllo, J.

Electrochemical Society
5 国際会議録 Studies of High-k Gate Dielectrics Deposited hy the Liquid Source Misted Chemical Deposition Method

Lee, D., Roman, P., Mumbauer, P., Grant, R., Horn, M., Ruzyllo, J.

Electrochemical Society
11 国際会議録 MONITORING OF SILICON SURFACE AFTER REACTIVE ION ETCHING

Hwang, D.K., Ruzyllo, J., Kamieniecki, E.

Electrochemical Society
6 国際会議録 Gate dielectric monitoring using noncontact electrical characterization

Ruzyllo,J., Roman,P., Lee,D.-O., Brubaker,M., Kamieniecki,E.

SPIE - The International Society for Optical Engineering
12 国際会議録 REMOVAL OF Al FROM SILICON SURFACES USING UV/Cl2

Daffron, C., Torek, K., Ruzyllo, J., Kamieniecki, E.

Electrochemical Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12