Influence of the Standard CMOS Procesing on Ta2O5 Gate Dielectric Transistors Performance
- 著者名:
Bersuker, G. ( (SEMA TECH) ) Gilmer, M. ( (SEMA TECH) ) Zeitzoff, P.M. ( (SEMA TECH) ) Brown, G.A. ( (SEMA TECH) ) Jackson, M.D. ( (SEMA TECH) ) Shaapur, F. ( (SEMA TECH) ) Foran, B. ( (SEMA TECH) ) Huff, H.R. ( (SEMA TECH) ) - 掲載資料名:
- Low and high dielectric constant materials : materials science, processing, and reliability issues : proceedings of the fifth international symposium
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 2000-5
- 発行年:
- 2000
- 開始ページ:
- 178
- 終了ページ:
- 186
- 総ページ数:
- 9
- 出版情報:
- Pennington, N.J.: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566772709 [1566772702]
- 言語:
- 英語
- 請求記号:
- E23400/2000-5
- 資料種別:
- 国際会議録
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