Low Dielectric Constant Material Deposited by HDPCVD for Barrier and Etch Stop Application in Cu Damascene Structure
- 著者名:
- Cho, S.-M. ( (Applied Materials) )
- Zhang, L. ( (Applied Materials) )
- M'saad, H. ( (Applied Materials) )
- Zhuang, L. ( (Applied Materials) )
- 掲載資料名:
- Low and high dielectric constant materials : materials science, processing, and reliability issues : proceedings of the fifth international symposium
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 2000-5
- 発行年:
- 2000
- 開始ページ:
- 48
- 終了ページ:
- 54
- 総ページ数:
- 7
- 出版情報:
- Pennington, N.J.: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566772709 [1566772702]
- 言語:
- 英語
- 請求記号:
- E23400/2000-5
- 資料種別:
- 国際会議録
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