Characterization of Ultrathin Oxide Interfaces (Tox <1 nm) in Oxide-Nitride Stack Formed by Remote Plasma Enhanced Chemical Vapor Deposition
- 著者名:
- 掲載資料名:
- The physics and chemistry of SiO2 and the Si-SiO2 interface-4, 2000 : proceedings of the fourth International Symposium on the Physics and Chemistry of SiO2 and the Si-SiO2 Interface, Tronto, Canada, May 15-18, 2000
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 2000-2
- 発行年:
- 2000
- 開始ページ:
- 209
- 終了ページ:
- 216
- 総ページ数:
- 8
- 出版情報:
- Pennington, N.J.: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566772679 [1566772672]
- 言語:
- 英語
- 請求記号:
- E23400/2000-2
- 資料種別:
- 国際会議録
類似資料:
Electrochemical Society |
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2
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Interfacial Properties of Si-Si3N4 Formed by Remote Plasma Enhanced Chemical Vapor Deposition
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