Review and Experimental Analysis of Oxide CMP Models
- 著者名:
- 掲載資料名:
- Chemical mechanical planariarization in IC device manufacturing III : proceedings of the international symposium
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 99-37
- 発行年:
- 1999
- 開始ページ:
- 217
- 終了ページ:
- 233
- 総ページ数:
- 17
- 出版情報:
- Pennington, N. J.: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566772600 [1566772605]
- 言語:
- 英語
- 請求記号:
- E23400/99-37
- 資料種別:
- 国際会議録
類似資料:
Materials Research Society |
SPIE-The International Society for Optical Engineering |
2
国際会議録
Analysis of in-situ vibration monitoring for end-point detection of CMP planarization processes
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
Materials Research Society |
Materials Research Society |
SPIE-The International Society for Optical Engineering |
11
国際会議録
Review of hardware-in-the-loop simulation and its prospects in the automotive area [6228-14]
SPIE - The International Society of Optical Engineering | |
Electrochemical Society |
Springer-Verlag Berlin Heidelberg New York Tokyo |