THE REACTION OF OZONE AND H2O2 IN AMMONIUM HYDROXIDE (NH4OH) SOLUTIONS AND THEIR REACTION WITH SILICON WAFERS

THE REACTION OF OZONE AND H2O2 IN AMMONIUM HYDROXIDE (NH4OH) SOLUTIONS AND THEIR REACTION WITH SILICON WAFERS

著者名:

Eom, Dae-Hong

掲載資料名:

Cleaning technology in semiconductor device manufacturing : proceedings of the sixth international symposium

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

99-36

発行年:

1999

開始ページ:

288

終了ページ:

295

総ページ数:

8

出版情報:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566772594 [1566772591]

言語:

英語

請求記号:

E23400/99-36

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013964
シリーズID:	PA00000028
会議名:	International Symposium on Cleaning Technology in Semiconductor Device Manufacturing
回次:	6th
会議開催地:	Honolulu, Hawaii, USA
会議開催年:	1999.10.00

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