APPLICATION OF MOIST OZONE GAS PHASE FOR REMOVAL OF RESIST AND ORGANIC CONTAMINATION IN A NOVEL TANK TYPE PROCESSOR

APPLICATION OF MOIST OZONE GAS PHASE FOR REMOVAL OF RESIST AND ORGANIC CONTAMINATION IN A NOVEL TANK TYPE PROCESSOR

著者名:

Wolke, K.

掲載資料名:

Cleaning technology in semiconductor device manufacturing : proceedings of the sixth international symposium

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

99-36

発行年:

1999

開始ページ:

204

終了ページ:

211

総ページ数:

8

出版情報:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566772594 [1566772591]

言語:

英語

請求記号:

E23400/99-36

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013964
シリーズID:	PA00000028
会議名:	International Symposium on Cleaning Technology in Semiconductor Device Manufacturing
回次:	6th
会議開催地:	Honolulu, Hawaii, USA
会議開催年:	1999.10.00

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