CARRIER INDUCED SILICON PITTING IN THE HF-RCA CLEANING SEQUENCES

CARRIER INDUCED SILICON PITTING IN THE HF-RCA CLEANING SEQUENCES

著者名:

掲載資料名:

Cleaning technology in semiconductor device manufacturing : proceedings of the sixth international symposium

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

99-36

発行年:

1999

開始ページ:

173

終了ページ:

179

総ページ数:

7

出版情報:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566772594 [1566772591]

言語:

英語

請求記号:

E23400/99-36

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013964
シリーズID:	PA00000028
会議名:	International Symposium on Cleaning Technology in Semiconductor Device Manufacturing
回次:	6th
会議開催地:	Honolulu, Hawaii, USA
会議開催年:	1999.10.00

類似資料:

1 国際会議録 EFFECT OF WAFER BACKSIDE ON PARTICLE ADDITION BEHAVIOUR OF HF-RCA SEQUENCE Strada, M., Lodi, D., Bellandi, E., Alessandri, M. Electrochemical Society	7 国際会議録 ANALYSIS OF THE HF-ETHANOL CLEANING PROCESS ON SILICON WAFERS WITH 100 VICINAL SURFACES Portillo, J., Gual, J., Sarrabayrouse, G., Morante, J. R. MRS - Materials Research Society
2 国際会議録 THE ST CLEAN DUAL STEP CLEANING CONCEPT Bellandi, R., Alessandri, M., Lodi, D., Pipia, F. Electrochemical Society	8 国際会議録 HF Last Cleaning Before Silicon Epitaxy Patruno, P., Fleury, A., Wyborn, H., Andre, E., Tardif, F. Electrochemical Society
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4 国際会議録 PREVENTION OF Si ETCHING IN DILUTED SC1 SOLUTIONS Bellandi, E., Alessandri, M., Lodi, D., Strada, M., Pipia, S., Petitdidier, S., Levy, D. Electrochemical Society	10 国際会議録 Accurate HF carrier estimation Nelson, D. J., Marasovich, J. A. SPIE - The International Society of Optical Engineering
5 国際会議録 Investigation of Single-Wafer, Low Temperature Epitaxial Silicon Deposition with Clustered HF Pre- Clean Wise, R., Frystak, D., Barnett, J., Grothe, P., Fowler, B., Forest, E. Electrochemical Society	11 国際会議録 AFM Analysis of HF Vapor Cleaned SiO2 Surfaces Carter,R. J., Bergman, E. J., Lee, D. R., Owyang, J., Nemanich, R. J. MRS - Materials Research Society
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