LOW-TEMPERATURE ATMOSPHERIC AMBIENT RAPID LAMP CLEANING OF SILICON SURFACES

LOW-TEMPERATURE ATMOSPHERIC AMBIENT RAPID LAMP CLEANING OF SILICON SURFACES

著者名:

Roman, P.

掲載資料名:

Cleaning technology in semiconductor device manufacturing : proceedings of the sixth international symposium

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

99-36

発行年:

1999

開始ページ:

145

終了ページ:

149

総ページ数:

5

出版情報:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566772594 [1566772591]

言語:

英語

請求記号:

E23400/99-36

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013964
シリーズID:	PA00000028
会議名:	International Symposium on Cleaning Technology in Semiconductor Device Manufacturing
回次:	6th
会議開催地:	Honolulu, Hawaii, USA
会議開催年:	1999.10.00

類似資料:

1 国際会議録 Monitoring of HF/H2O Treated Silicon Surfaces Using Non-Contact Surface Charge Measurements Roman, P., Hwang, D., Torek, K., Ruzyllo, J., Kamieniecki, E. MRS - Materials Research Society	7 国際会議録 Characterization of High-K Dielectrics Using the Non-Contact Surface Charge Profiler (SCP) Method Roman, P., Lee, D., Mumbauer, P., Grant, R., Kamieniecki, E., Ruzyllo, J. Electrochemical Society
2 国際会議録 MONITORING OF Fe CONTAMINATION ON Si SURFACES USING NON-CONTACT SURFACE CHARGE PROFILER Roman, P., Kashkoush, I., Novak, R.E., Kamieniecki, E., Ruzyllo, J. Electrochemical Society	8 国際会議録 SILICON SURFACES EXPOSED TO ANHYDROUS HF/CH3OH ETCHING Torek, K., Ruzyllo, J., Kamieniecki, E. Electrochemical Society
3 国際会議録 CLEANING OF SILICON SURFACE AFTER RIE USING UV/OZONE AND HF/CH3OH Hwang, D.K., Ruzyllo, J., Kamieniecki, E. Electrochemical Society	9 国際会議録 MONITORING OF SILICON SURFACE AFTER REACTIVE ION ETCHING Hwang, D.K., Ruzyllo, J., Kamieniecki, E. Electrochemical Society
4 国際会議録 REMOVAL OF Al FROM SILICON SURFACES USING UV/Cl2 Daffron, C., Torek, K., Ruzyllo, J., Kamieniecki, E. Electrochemical Society	10 国際会議録 REVERSING OF SILICON SURFACE AGING BY LAMP CLEANING Shanmugasundaram, K., Chang, K., Shallenberger, J., Danel, A., Tardif, F., Ruzyllo, J. Electrochemical Society
5 国際会議録 Characterization of Thin Dielectric Layers using the Non-Contact Surface Charge Profiler (SCP) Method Roman, P., Lee, D.D., Wang, J., Mumbauer, P., Grant, R., Tower, J., Kamieniecki, E., Lukasiak, L., Ruzyllo, aud J. Electrochemical Society	11 国際会議録 Semiconductor Surface Cleaning and Conditioning Challenges Beyond Planar Silicon Technology J. Ruzyllo Electrochemical Society
6 国際会議録 Process monitoring using surface charge profiling(SCP)method Ruzyllo,J., Roman,P., Staffa,J., Kashkoush,I., Kamieniecki,E. SPIE-The International Society for Optical Engineering	12 国際会議録 Feasibility of surface photovoltage based characterization of ultra-thin SOI wafers Lukasiak, L., Kamieniecki, E., Jakubowski, A., Ruzyllo, J. Electrochemical Society

1

2

3

4

5

6

7

8

9

10

11

12