EVALUATION OF ADVANCED PRE-GATE CLEANINGS

EVALUATION OF ADVANCED PRE-GATE CLEANINGS

著者名:

掲載資料名:

Cleaning technology in semiconductor device manufacturing : proceedings of the sixth international symposium

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

99-36

発行年:

1999

開始ページ:

59

終了ページ:

68

総ページ数:

10

出版情報:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566772594 [1566772591]

言語:

英語

請求記号:

E23400/99-36

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013964
シリーズID:	PA00000028
会議名:	International Symposium on Cleaning Technology in Semiconductor Device Manufacturing
回次:	6th
会議開催地:	Honolulu, Hawaii, USA
会議開催年:	1999.10.00

類似資料:

1 国際会議録 PERFORMANCE OF 'DDC': DILUTED DYNAMIC CLEAN BEFORE 4.5 nm GATE OXIDE Boelen, P., Matthews, R., Kashkoush, I., Novak, R. Electrochemical Society	7 国際会議録 PARTICLE IMPACT ON 7 nm GATE OXIDES Paillet, C., Papon, A.M., Joly, J.P., Tardif, F., Levy, D., Barla, K., Patruno, P. Electrochemical Society
2 国際会議録 OPTIMIZATION OF DILUTE SC1 Boelen, P., Lardin, T., Sandrier, B., Matthews, R., Kashkoush, I., Novak, R., Tardif, F. Electrochemical Society	8 国際会議録 AQUEOUS SINGLE PASS SINGLE WAFER AI/VIA CLEANING Verhaverbeke, S., Beaudry, C., Boelen, P. Electrochemical Society
3 国際会議録 MECHANICAL RESISTANCE OF FINE MICROSTRUCTURES RELATED TO PARTICLE CLEANING MECHANISMS Tardif, F., Raccurt, O., Barbe, J.C., De Crecy, F., Besson, P., Danel, A. Electrochemical Society	9 国際会議録 HF Last Cleaning Before Silicon Epitaxy Patruno, P., Fleury, A., Wyborn, H., Andre, E., Tardif, F. Electrochemical Society
4 国際会議録 OPTIMIZATION OF HF AND OXIDANT WET CLEANINGS BEFORE 7nm GATE OXIDE Tardif, F., Lardin, T., Paillet, C., Joly, J.P., Fleury, A., Patruno, P., Levy, D., Barla, K. Electrochemical Society	10 国際会議録 EFFECTS OF PRE-GATE OXIDATION CLEANING AND GETTERING UPON THE VERY THIN OXIDE INTEGRITY Lee, J., Tung, C.Y., Hahn, S., Chiao, P. Materials Research Society
5 国際会議録 Application of In-Line, Non-Destructive Electrical Metrology in the Evaluation of the Effect of Pre-Gate Clean P. Y. Hung, L. Tan, J. Barnett, R. Hillard, C. Young, A. Diebold Electrochemical Society	11 国際会議録 In Situ PRE-EPI CLEAN PROCESS FOR NEXT GENERATION DEVICES Kashkoush, I., Chen, G., Ciari, R., Novak, R. Electrochemical Society
6 国際会議録 COMPARISON OF VAPOR-PHASE AND WET CHEMICAL PRE-GATE OXIDE AND PRE-CONTACT CLEANS Draper, C.W., Anyanwu, V.E., Eisenberg, J.H., Felton, G.J., Roy, P.K., Chittipeddi, S., Bechtold, P.F., Hagner, G., … Electrochemical Society	12 国際会議録 HF CONCENTRATION OF CONTROL IN IC MANUFACTURING Kashkoush, Ismail, Chen, G., Boelen, P., Geomini, M. Electrochemical Society

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