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Evaluation of 02- and N2- Addition in Via Etching and CHF3/02 Post Etch Treatment

著者名:
Ho, C.N.
Higelin, G.
Low, C.H.
See, A.
Chan, L.
Chua, D.H.C.
さらに 1 件
掲載資料名:
Plasma etching processes for sub-quarter micron devices : proceedings of the international symposium
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
99-30
発行年:
1999
開始ページ:
269
終了ページ:
283
総ページ数:
15
出版情報:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566772532 [1566772532]
言語:
英語
請求記号:
E23400/99-30
資料種別:
国際会議録

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