0.13 μm CMOS Technology with Optimized Poly-Si/No-Oxide Gate Stack
- 著者名:
Kubicek, S. Jansen, P. Badenes, G. Schaekers, M. Koldyaev, V. Deferm, L. De Meyer, K. Kerr, D. Naem, A. - 掲載資料名:
- ULSI process integration : proceedings of the first international symposium
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 99-18
- 発行年:
- 1999
- 開始ページ:
- 193
- 終了ページ:
- 202
- 出版情報:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566772419 [1566772419]
- 言語:
- 英語
- 請求記号:
- E23400/99-18
- 資料種別:
- 国際会議録
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