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Evaluation of Ultra-Thin Gate Evaluation of Ultra-Thin Gate Stack Dielectrics for 0.1 jim PMOSFETs

著者名:
Srivastava, A.
Osburn, C.M.
Yee, K.F.
Heinisch, H.H.
Vogel, E.M
Abmed, K.Z.
Wang, Z.
Min, K.
TimberJoke, B.
Parker, C.
Worimnan, J.J.
Hauser, J.R.
さらに 7 件
掲載資料名:
Advances in rapid thermal processing : proceedings of the symposium
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
99-10
発行年:
1999
開始ページ:
81
終了ページ:
88
総ページ数:
8
出版情報:
Pennington, N. J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566772327 [156677232X]
言語:
英語
請求記号:
E23400/99-10
資料種別:
国際会議録

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