Evaluation of Ultra-Thin Gate Evaluation of Ultra-Thin Gate Stack Dielectrics for 0.1 jim PMOSFETs
- 著者名:
Srivastava, A. Osburn, C.M. Yee, K.F. Heinisch, H.H. Vogel, E.M Abmed, K.Z. Wang, Z. Min, K. TimberJoke, B. Parker, C. Worimnan, J.J. Hauser, J.R. - 掲載資料名:
- Advances in rapid thermal processing : proceedings of the symposium
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 99-10
- 発行年:
- 1999
- 開始ページ:
- 81
- 終了ページ:
- 88
- 総ページ数:
- 8
- 出版情報:
- Pennington, N. J.: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566772327 [156677232X]
- 言語:
- 英語
- 請求記号:
- E23400/99-10
- 資料種別:
- 国際会議録
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