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Enabling Single-Wafer Process Technologies for Reliable Ultra-Thin Gate Dielectrics

著者名:
Miner, G.
Xing, G.
Joo, H.S.
Sonchez, F.
Yokoa, Y.
Chen, C.
Lopes, D.
Balakrishna, A.
さらに 3 件
掲載資料名:
Advances in rapid thermal processing : proceedings of the symposium
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
99-10
発行年:
1999
開始ページ:
3
終了ページ:
14
総ページ数:
12
出版情報:
Pennington, N. J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566772327 [156677232X]
言語:
英語
請求記号:
E23400/99-10
資料種別:
国際会議録

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