PFC Emissions Reduction and Atomic Fluorine Generation Using C3F8 and Remote CVD Chamber Cleaning Technology

PFC Emissions Reduction and Atomic Fluorine Generation Using C3F8 and Remote CVD Chamber Cleaning Technology

著者名:

Zazzera, L. ( 3M Company )

Kesari, S. ( 3M Company )

Reagen, W. ( 3M Company )

Tousignant, L. ( 3M Company )

Holber, W. ( AsteX, Inc. )

Chen, X. ( AsteX, Inc. )

さらに 1 件

掲載資料名:

Environmental issues in the electronics and semiconductor industries : proceedings of the second international symposium

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

99-8

発行年:

1999

開始ページ:

10

終了ページ:

19

出版情報:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566772303 [1566772303]

言語:

英語

請求記号:

E23400/99-8

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013938
シリーズID:	PA00000028
会議名:	Symposium on Environmental Issues with Materials and Processes in the Electronics and Semiconductor Industries ; Meeting of the Electrochemical Society
回次:	2nd ; 195th
会議開催地:	Seattle, WA, USA
会議開催年:	1999.05.00

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