Impact of Heavy Boron and Antimony Doping on COPs and GOI

Impact of Heavy Boron and Antimony Doping on COPs and GOI

著者名:

掲載資料名:

Proceedings of the Third International Symposium on Defects in Silicon

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

99-1

発行年:

1999

開始ページ:

300

終了ページ:

312

総ページ数:

13

出版情報:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566772235 [1566772230]

言語:

英語

請求記号:

E23400/99-1

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013931
シリーズID:	PA00000028
会議名:	International Symposium on Defects in Silicon ; Meeting of the Electrochemical Society
回次:	3rd ; 195th
会議開催地:	Seattle, WA, USA
会議開催年:	1999.05.02-1999.05.07

類似資料:

1 国際会議録 EFFECT OF HEAVY BORON DOPING ON OXIDE PRECIPITATE GROWTH IN CZOCHRALSKI SILICON Ono, T., Asayama, E., Horie, H., Hourai, M., Sueoka, K., Tsuya, H., Rozgonyi, G.A. Electrochemical Society	7 国際会議録 Control of grown-in defects in nitrogen-doped CZ silicon crystal for new generation devices Hourai, M., Ono, T., Umeno, S., Tanaka, T., Asayaoia, E., Nishikawa, H., Sano, M., Tsuya, H. Electrochemical Society
2 国際会議録 RADIAL DISTRIBUTION OF THERMALLY-INDUCED DEFECTS IN HEAVILY BORON-DOPED SILICON WAFERS Asayama, E., Ono, T., Takeshita, M., Hourai, M., Sano, M., Tsuya, H. Electrochemical Society	8 国際会議録 Effect of Heavy Boron Doping on Oxygen Precipitation in Czochralski Silicon Substrates of Epitaxial Wafers Sucoka, K., Yonemura, M., Akatsuka, M., Katahama, H., Ono, T., Asayama, E. Electrochemical Society
3 国際会議録 Crystal originated particles (COPs), bulk defects including the OSF ring, gate oxide integrity (GOI), and DRAM yield Rozgonyi, G., Tamatsuka, M., Bae, K.-M., Gonzales, F. Electrochemical Society	9 国際会議録 Oxygen Precipitation Behaviour in 300 mm Polished Czochralski Silicon Wafers Ono, T., Rozgonyi, G.A., Au, C., Messina, T., Goodall, R.K., Huff, H.R. Electrochemical Society
4 国際会議録 Novel GOI Failure Analysis Using SEM/MOS/EBIC with SubNano Ampere Current Breakdown Tamatsuka,M., Oka,S., Kirk,H.R., Rozgonyi,G.A. SPIE-The International Society for Optical Engineering	10 国際会議録 CLEANING AND OXIDATION OF HEAVILY DOPED Si SURFACES Yasaka, T., Uenaga, S., Yasutake, H., Takakura, M., Miyazaki, S., Hirose, M. Materials Research Society
5 国際会議録 Novel GOI Failure Analysis Using SEM/MOS/EBIC with SubNano Ampere Current Breakdown Tamatsuka, M., Oka, S., Kirk, H.R., Rozgonyi, G.A. Electrochemical Society	11 国際会議録 Influence of Various Factors on the COP-Related Gate Oxide Integrity Degradation of Si Wafers Miyazaki,M., Miyazaki,S., Kitamura,T. SPIE - The International Society for Optical Engineering
6 国際会議録 Determination of COP distribution after SC1 cleaning by a laser particle counter Fujise,T., Yanase,Y., Hourai,M., Sano,M., Tsuya,H. SPIE-The International Society for Optical Engineering	12 国際会議録 Electric Field Effect on Iron-Boron Pair/Interstitial Iron Dissociation/Re-Assodation Kikuchi, H., Agarwai, A., Koveshnikov, S., Rozgonyi, G.A. Electrochemical Society

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