The Effect of Oxygen Incorporation in ELA Poly-SI Films and Its Relation to Poly-Si TFT Device Performance
- 著者名:
- 掲載資料名:
- Proceedings of the fourth Symposium on Thin Film Transistor Technologies
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 98-22
- 発行年:
- 1998
- 開始ページ:
- 43
- 終了ページ:
- 50
- 総ページ数:
- 8
- 出版情報:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566772167 [1566772168]
- 言語:
- 英語
- 請求記号:
- E23400/98-22
- 資料種別:
- 国際会議録
類似資料:
MRS - Materials Research Society |
SPIE-The International Society for Optical Engineering |
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SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
4
国際会議録
Device and Process Technology Requirements for Next-Generation, Ultra-High- Performance Poly-Si TFTs
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