Microfabrication of Membrane-Based Devices by Deep-Reactive Ion Etching (DRIE) of Silicon

Microfabrication of Membrane-Based Devices by Deep-Reactive Ion Etching (DRIE) of Silicon

著者名:

掲載資料名:

Proceedings of the International Symposium on Microstructures and Microfabricated Systems IV

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

98-14

発行年:

1998

開始ページ:

62

終了ページ:

69

出版情報:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566772068 [1566772060]

言語:

英語

請求記号:

E23400/98-14

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013917
シリーズID:	PA00000028
会議名:	International Symposium on Microstructures and Microfabricated Systems ; Meeting of the Electrochemical Society
回次:	4th ; 194th
会議開催地:	Boston, Massachusetts, USA
会議開催年:	1998.11.01-1998.11.06

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