Selected Topics in Plasma Processing Research | 東京工業大学附属図書館文献データベース

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Selected Topics in Plasma Processing Research

著者名:

さらに 8 件

掲載資料名:

Proceedings of the twelfth International Symposium on Plasma Processing

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

98-4

発行年:

1998

開始ページ:

1

終了ページ:

12

出版情報:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566771986 [1566771986]

言語:

英語

請求記号:

E23400/98-4

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013907
シリーズID:	PA00000028
会議名:	International Symposium on Plasma Processing ; Meeting of the Electrochemical Scoety
回次:	12th ; 193rd
会議開催地:	San Diego, CA, USA
会議開催年:	1998.05.03-1998.05.08

類似資料:

1 国際会議録 High Density Plasma Gate Etching of 0.12 um Devices with Sub-1.5 nm Gate Oxides Klemens, F.P., Baumann, F.H., Kornblit, A., Layadi, N., Lee, H., Maynard, H.L., Mytych, J.M., Sorch, T.W., Tennant, … Electrochemical Society	7 国際会議録 SELECTED TOPICS IN UPSILON PHYSICS Lee-Franzini J. Plenum Press
2 国際会議録 Depth of focus enhancement for 193-nm window lithography with subresolution assist features Watson,G.P., Kroyan,A., Cirelli,R.A., G,P Klemens, Timp,L., Nalamasu,O., Maynard,Lucent H.L., Sweeney,J.R., … SPIE - The International Society for Optical Engineering	8 国際会議録 Hyperthermal Nitridation for Ultrathin Silicon Oxynitride Gate Dielectrics Krug, C., Baumvol, I.J.R., Stedile, F.C., Green, M.L., Klemens, F., Silverman, P.J., Sorsch, T.W., Alvarez, F., Hammer, … Electrochemical Society
3 国際会議録 The Vertical Replacement-Gate (VRG) MOSFET: A High-Performance, Vertical MOSFET with Lithography-Independent Critical Dimensions Hergenrother, J.M., Oh, S.H., Nigam, T., Monroe, D., Klemens, F.P., Kornblit, A., Baumann, F.H., Grazul, J.L., Johnson, … Electrochemical Society	9 国際会議録 *Gate technology issues for silicon MOS nanotransistors Tennant, D. M., Timp, G. L., Ocola, L. E., Green, M., Sorsch, T., Kornblit, A., Klemens, F., Kleiman, R., Muller, D. A., … MRS-Materials Research Society
4 国際会議録 MEMS mirror array for a wavelength-selective 1xK switch (Invited Paper) Lopez, D.O., Pardo, F., Aksyuk, V.A., Simon, M.E., Shea, H.R., Marom, D.M., Neilson, D.T., Cirelli, R.A., Klemens, F.P., … SPIE-The International Society for Optical Engineering	10 国際会議録 Evolution of an advanced topics course Donnelly, J. F., Seebeck, R. G. SPIE - The International Society of Optical Engineering
5 国際会議録 Cl2 Plasma-Si Surface Interactins in Plasma Etching Donnelly M. V., Layadi N., Lee C. T. J., Herman P. I., Guinn V. K., Cheng C. C. kluwer Academic Publishers	11 国際会議録 Nanoscale Electronic Devices The Nano-Transistor Timp, G., Baumann, F., Bude, J., Bourdelle, K.K., Green, M., Grazul, J., Chetti, A., Forsyth, G., Kleiman, R., Kiemens, … Electrochemical Society
6 国際会議録 Toward the ultimate storage device: the fabrication of an ultrahigh-density memory device with 193-nm lithography Cirelli, R. A., Bude, J., Mansfield, W. M., Timp, G. L., Klemens, F. P., Watson, C. P., Weber, G. R., Sweeney, J R., … SPIE - The International Society of Optical Engineering	12 国際会議録 INVITED: 50 nm VERTICAL REPLACEMENT-GATE (VRG) nMOSFETS WITH ALD HfO2 GATE DIELECTRICS Hergenrother, J.M., Nigani, T., Wilk, O.D., Klemens, F.P., Monroe, D., Sorsch, T.W., Busch, B., Green, M.L., Muller, … Electrochemical Society

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