The Role of Plasma Chemistry and Ion Density in Dry Etching of Nitrides

The Role of Plasma Chemistry and Ion Density in Dry Etching of Nitrides

著者名:

掲載資料名:

Proceedings of the Second Symposium on III-V Nitride Materials and Processes

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

97-34

発行年:

1997

開始ページ:

39

終了ページ:

56

出版情報:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566771870 [1566771870]

言語:

英語

請求記号:

E23400/97-34

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013896
シリーズID:	PA00000028
会議名:	Symposium on III-V Nitride Materials and Processes
回次:	2nd
会議開催地:	Paris, France
会議開催年:	1997.08.31-1997.09.05

類似資料:

1 国際会議録 Plasma Chemistries for Dry Etching GaN, AlN, InGaN and InAlN Pearton, S. J., Vartuli, C. B., Lee, J. W., Donovan, S. M., MacKenzie, J. D., Abernathy, C. R., Shul, R. J., McLane, G. … MRS - Materials Research Society	7 国際会議録 Cl2-Based Dry Etching of the AlGalnN System in Inductively-Coupled Plasmas Cho, Hyun, Vartuli, C. B., Abernathy, C. R., Donovan, S. M., Pearton, S. J., Shul, R. J., Han, J. MRS - Materials Research Society
2 国際会議録 Dry Etching and Implantation Characteristics of III-N Alloys Pearton, S.J., Vartuli, C.B., Shul, R.J., Zolper, J.C. Electrochemical Society	8 国際会議録 ICP Dry Etching of III-V Nitrides Vartuli, C. B., Lee, J. W., MacKenzie, J. D., Donovan, S. M., Abernathy, C. R., Pearton, S. J., Shul, R. J., … MRS - Materials Research Society
3 国際会議録 Effect of Dry Etching in III-Nitride Surface Properties Ren, F., Lothian, J.R., Pearton, S.J., Abernathy, C.R., Vartuli, C.B., Karlicek, B., Karlicek, R.F., Jr., MacKenzie, … Electrochemical Society	9 国際会議録 ECR Etching of Group-III Nitride Binary and Ternary Films Shul, R.J., Howard, A.J., Pearton, S.J., Abernathy, C.R., Variuli, C.B., Barnes, P.A. Electrochemical Society
4 国際会議録 Hydrogen Incorporation into III-V Nitrides During Processing Pearton, S.J., Shul, R.J., Wilson, R.G., Ren, F., Zavada, J.M., Abernathy, C.R., Vartuli, C.B., Lee, J.W., Mileham, … Electrochemical Society	10 国際会議録 Plasma Chemistry Dependent ECR Etching of GaN Shul, R. J., Ashby, C. I. H., Rieger, D. J., Howard, A. J., Pearton, S. J., Abernathy, C. R., Vartuli, C. B., Barnes, P. … MRS - Materials Research Society
5 国際会議録 High Rate ECR Etching of III-V Nitride Materials Shul, R.J., Howard, A.J., Kilcoyne, S.P., Pearton, S.J., Abernathy, C.R., Vartuli, C.B., Barnes, P.A., Bozack, M.J. Electrochemical Society	11 国際会議録 Selective dry etching of the GaN/InN/AlN, GaAs/AlGaAs and GaAs/InGaP systems Hays, D.C., Abernathy, C.R., Hobson, W.S., Pearton, S.J., Han, J., Shul, R.J., Cho, H., Jung, K.B., Ren, F., Hahn, Y.B. Materials Research Society
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