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Statistical Modeling and Experimental Verification of Electromigration Time to Fail Distribution in Metal Interconnects

著者名:
Capasso, C.
Gall, M.
Anderson, S.
Jawarani, D.
Hernandez, R.
Kawasaki, H.
さらに 1 件
掲載資料名:
Proceedings of the Symposium on Interconnect and Contact Metallization
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
97-31
発行年:
1997
開始ページ:
196
終了ページ:
202
出版情報:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566771849 [1566771846]
言語:
英語
請求記号:
E23400/97-31
資料種別:
国際会議録

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