Blank Cover Image

Charge Damage Caused by Electron Shading Effect During Sputter Etch Pre-Cleaning of Via Contact

著者名:
掲載資料名:
Proceedings of the International Symposium on Thin Film Materials, Processes, Reliability, and Applications, Thin Film Processes
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
97-30
発行年:
1997
開始ページ:
175
終了ページ:
182
出版情報:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566771832 [1566771838]
言語:
英語
請求記号:
E23400/97-30
資料種別:
国際会議録

類似資料:

1 国際会議録 Plasma charging effects on device degradation from via sputter etch

Vishnubhotla,L., Ling,J., Huang,J., Wu,Y., Smith,G., Zamanian,M., Liou,F.-T., Ashtiani,K.A., Nicholas,M.D.Mc

SPIE-The International Society for Optical Engineering
7 国際会議録 Single Electron Charging Effect in Individual Si Nanocrystals

Gentile, P., Baron, T., Magnea, N., Mur, P., Martin, F., Semeria, M. N.

Materials Research Society
2 国際会議録 Damage Free, Low Via Resistance Sputter Cleaning Technology for ULSI Devices

Y. Tanaka, M. Taoka, H. suzuki, F. Yanagawa, B. Cohen, H. Hanawa, T. Taniguchi, M. Togashi, K. Watanabe

Electrochemical Society
8 国際会議録 SURFACE CLEANING FOR SILICON EPITAXY USING PHOTOEXCITED FLUORINE GAS

Aoyama, Takayuki, Yamazaki, Tatsuya, Ito, Takashi

MRS - Materials Research Society
3 国際会議録 HYDROGEN PASSIVATION CAUSED BY 'SOFT' SPUTTER ETCH CLEANING OF Si

Vercaemst, A. S., Meirhaeghe, R. L. Van, Laflere, W., Cardon, F.

MRS - Materials Research Society
9 国際会議録 SURFACE DAMAGE CAUSED BY METAL ETCH PROCESSES AS MEASURED BY ATOMIC FORCE MICROSCOPY

Grant, J.M., Allen, L.R.

Electrochemical Society
4 国際会議録 *PHOTO-EXCITED CLEANING OF SILICON WITH CHLORINE AND FLUORINE

Ito, T., Sugino, R., Sato, Y., Okuno, M., Osawa, A., Aoyama, T., Yamazaki, T., Arimoto, Y.

Materials Research Society
10 国際会議録 Plasma Charging Damage Performance Assessment with Scaled-up Process from 200 mm to 300 mm Dielectric Etch Chambers

Ma, S., Bjorkman, C., Mays, B., Kropwenicki, T., Feng, T., Li, Q., Dadu, U., Chang, M., Shan, H.

Electrochemical Society
5 国際会議録 Optical properties of sputtered Ge films

T. Yamaguchi, T. Ohmi, M. Aoyama

Society of Photo-optical Instrumentation Engineers
11 国際会議録 Simulation of charging voltages on a wafer during plasma etch

Oner,M., Bhuva,B.L., Sisterhen,P., Hasan,H., Kerns,S.E.

SPIE-The International Society for Optical Engineering
6 国際会議録 Reduction of fogging effect caused by scattered electrons in an electron beam system

Shimomura, N., Ogasawara, M., Takamatsu, J., Yoshitake, S., Ooki, K., Nakayamada, N., Okabe, F., Tojo, T.

SPIE - The International Society of Optical Engineering
12 国際会議録 Contact Analysis of Tooth Surface in Gear Meshing Based on Infrared Ray Imagery

K. Nakajima, T. Hirogaki, E. Aoyama, M. Nagata

Trans Tech Publications
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12