The Effect of In -Situ N2/H2 Plasma Treatment on the Properties of Chemically Vapor Deposited TiN

The Effect of In -Situ N2/H2 Plasma Treatment on the Properties of Chemically Vapor Deposited TiN

著者名:

掲載資料名:

Chemical vapor deposition : proceedings of the Fourteenth International Conference and EUROCVD-11

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

97-25

発行年:

1997

開始ページ:

1626

終了ページ:

1634

総ページ数:

9

出版情報:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566771788 [1566771781]

言語:

英語

請求記号:

E23400/97-25

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013887
シリーズID:	PA00000028
会議名:	International Conference on Chemical Vapor Deposition ; EUROCVD
回次:	14th ; 11th
会議開催地:	Paris, France
会議開催年:	1997.09.05-1997.09.09

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