Deposition of LPCVD Amorphous Silicon Thin Films With a Low Content of Germanium: Crystallization and Electrical Characteristics
- 著者名:
Briand, D. Kis-Sion, K. Mohammed-Brahim, T. Sarret, M. Le Bihan, F. Haji, L. Bonnaud, O. - 掲載資料名:
- Chemical vapor deposition : proceedings of the Fourteenth International Conference and EUROCVD-11
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 97-25
- 発行年:
- 1997
- 開始ページ:
- 1340
- 終了ページ:
- 1347
- 総ページ数:
- 8
- 出版情報:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566771788 [1566771781]
- 言語:
- 英語
- 請求記号:
- E23400/97-25
- 資料種別:
- 国際会議録
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1
国際会議録
Stress Induced during the Solid-Phase Crystallization of Amorphous Silicon Deposited by LPCVD
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MRS - Materials Research Society |
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