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Effect of In Situ H2 Plasma Pretreatment on the Low Temeprature Microcrystalline (μc-Si:H) Silicon Film Deposited on Amorphous Si02 and SiNx:H Surfaces

著者名:
掲載資料名:
Chemical vapor deposition : proceedings of the Fourteenth International Conference and EUROCVD-11
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
97-25
発行年:
1997
開始ページ:
1274
終了ページ:
1281
総ページ数:
8
出版情報:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566771788 [1566771781]
言語:
英語
請求記号:
E23400/97-25
資料種別:
国際会議録

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