Blank Cover Image

Study by in Situ FTIR Spectroscopy of the Roles of Homogeneous and Heterogeneous Reactions in the Decomposition of Precursors

著者名:
掲載資料名:
Chemical vapor deposition : proceedings of the Fourteenth International Conference and EUROCVD-11
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
97-25
発行年:
1997
開始ページ:
901
終了ページ:
908
総ページ数:
8
出版情報:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566771788 [1566771781]
言語:
英語
請求記号:
E23400/97-25
資料種別:
国際会議録

類似資料:

1 国際会議録 In Situ Studies of TEOS/OZONE CVD: Experimental Considerations for Probing Reactions in Commercial CVD Equipment

Condorelli, G.G., Hitchman, M.L., Kovalgin, A.Y., Shamlian, S.H.

Electrochemical Society
7 国際会議録 CVD of high precision optical coatings

Hitchman, M. L., Manookian, W., Shamlian, S. H., Gibson, D. R.

Electrochemical Society
2 国際会議録 Low Temperature CVD OF Tantalum Oxide Films

Li, X., Hitchman, M.L., Shamlian, S.H.

Electrochemical Society
8 国際会議録 In-Situ FTIR Study on the Role of Surface Hydrides and Fluorides in Low-Temperature Si-CVD

Chung, C.-H., Rhee, S.-W., Moon, S.H.

Electrochemical Society
3 国際会議録 Chemical Vapor Deposition of High Precision Optical Coatings

M.L. Hitchman, S.H. Shamlian, D.R. Gibson

Society of Vacuum Coaters
9 国際会議録 Mechanisms of Thermal and Photo Assisted MOCVD Processes From M(hfac)2Tetraglyme (M=Sr, Ba) Precursors

Condorelli, G.G., Anastasi, G., Giuffrida, S., Fragala, I.L.

Electrochemical Society
4 国際会議録 Study of Precursors for Atmospheric Pressure Plasma Enhanced CVD (AP-PECVD) of Silicon Dioxide Films

Alexandrov, S.E., Hitchman, M.L., McSporran, N.

Electrochemical Society
10 国際会議録 Comparative Study of Partial Oxidation of Methane to Synthesis Gas over Supported Rh and Ru Catalysts Using in situ Time-Resolved FTIR and in situ Microprobe …

Weng, W.Z., Yan, Q.G., Lou, C.R., Liao, Y.Y., Chen, M.S., Wan, H.L.

Elsevier
5 国際会議録 Synthesized La(hfac)3 Anhydrous Precursor

Condorelli, G.G., Fruguhi, I.L

Electrochemical Society
11 国際会議録 A Study of Remote Plasma-Assisted CVD of Aluminium and Gallium Oxynitride Films by In Situ Optical Emission Spectroscopy

Kovalgin, A., Lermontova, N.

Electrochemical Society
6 国際会議録 MOCVD Kinetics of Precursors for Ferroeletric SBT Film

Baeri, A., Condorelli, G.G., Fragala, I.L.

Materials Research Society
12 国際会議録 In Situ Measurement of the Decomposition on GaN OMVPE Precursors by Raman Spectroscopy

Park, C., Lee, S., Seo, J., Huang, M., Anderson, T.J.

Electrochemical Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12