Kinetics of Chemical Vapor Depostion of Titanium Nitride
- 著者名:
- 掲載資料名:
- Chemical vapor deposition : proceedings of the Fourteenth International Conference and EUROCVD-11
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 97-25
- 発行年:
- 1997
- 開始ページ:
- 592
- 終了ページ:
- 599
- 総ページ数:
- 8
- 出版情報:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566771788 [1566771781]
- 言語:
- 英語
- 請求記号:
- E23400/97-25
- 資料種別:
- 国際会議録
類似資料:
Electrochemical Society |
7
国際会議録
Chemical Vapor Deposition of Pyrolytical Carbon and Graded C/SiC/Si-Films at Atmospheric Pressure
Electrochemical Society |
MRS - Materials Research Society |
Electrochemical Society |
Electrochemical Society | |
4
国際会議録
CVD of SiC from CH3SiCl3 in a Hot-Wall-Reactor System: Transport Pheonomena and Kinetic Aspects
Electrochemical Society |
Electrochemical Society |
Electrochemical Society |
11
国際会議録
Precursors for the Chemical Vapor Deposition of Titanium Nitride and Titanium Aluminum Nitride Films
MRS - Materials Research Society |
Electrochemical Society |
12
国際会議録
SUPERCONDUCTING YBa2Cu3O7-x THIN FILMS ON METAL SUBSTRATE BY CHEMICAL VAPOR DEPOSTION PROCESS
Materials Research Society |