Blank Cover Image

Water Vapor and Chlorine Effects on the Epitaxial Growth of SiGe Films by CVD

著者名:
掲載資料名:
Chemical vapor deposition : proceedings of the Fourteenth International Conference and EUROCVD-11
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
97-25
発行年:
1997
開始ページ:
123
終了ページ:
130
総ページ数:
8
出版情報:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566771788 [1566771781]
言語:
英語
請求記号:
E23400/97-25
資料種別:
国際会議録

類似資料:

1 国際会議録 Selective Epitaxial Growth of SiGe Films in LPCVD Reactor Systems- Characterization of SiGe Films by Ellipsometry

Lee, I.M., Wang, W.C., Koh, M.T.K., Denton, J.P., Takoudis, C.G., Kram, E.P., Neudeck, G.W.

Electrochemical Society
7 国際会議録 MEASUREMENT OF THE CRITICAL LEVEL OF MOISTURE FOR INITIATION OF WATER-VAPOR-INDUCED ENVIRONMENTAL EMBRITTLEMENT IN AN Fe3Al-BASED ALLOY

McKamey, C.G., Lee, E.H.

Materials Research Society
2 国際会議録 Thermodynamic and Kinetic Studies of Si1-xGex Chemical Vapor Deposition

Lee, I-M., Takoudis, C.G.

Electrochemical Society
8 国際会議録 Design and simulation of a vacuum micropump

Cui,Z., Takoudis,C.G.

SPIE-The International Society for Optical Engineering
3 国際会議録 Low Pressure Chemical Vapor Deposition of Epitaxial Silicon-Germanium, Epitaxial Silicon and Poly-Silicon

Lee, I-M.R., Neudeck, G.W., Takoudis, C.G.

Electrochemical Society
9 国際会議録 Thick Epitaxial Layers Growth by Chlorine Addition

F. La Via, G. Izzo, M. Camarda, G. Abbondanza, D. Crippa

Trans Tech Publications
4 国際会議録 Emission Infared Spectroscopy as an in-Situ Probe of CVD at High Gas Pressures: The Epitaxial Silicon CVD

Christopher, P., Takoudis, C.G.

Electrochemical Society
10 国際会議録 Growth of Hexagonal GaN Films hy MOCVD Using Novel Single Precursors

Kim, C.G., Yoo, S.H., Lee, J.H., Lee, Y.K., Sung, M.M., Kim, Y.

Electrochemical Society
5 国際会議録 In-Situ Infrared Emission Spectroscopy During Silicon Chemical Vapor Deposition

Takoudis. C.G., Panezyk, C.

Electrochemical Society
11 国際会議録 Investigation on Wear- and Corrosion Resistance of TiN Films by CVD

C. Wang, C.G. Zhou

Trans Tech Publications
6 国際会議録 In Situ FTIR Emission Spectroscopy in Silicon Chemical Vapor Deposition on H-Terminated Si(111) and Si(100) Surfaces

Panczyk, C., Takoudis, C.G.

American Institute of Chemical Engineers
12 国際会議録 Furnace Silicon Oxynitridation in Nitrous Oxide Ambients

Singhvi, S., Takoudis, C.G.

Electrochemical Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12